Autorzy | |
Wydawnictwo | Elsevier S & T |
Data wydania | 03/04/2018 |
Forma publikacji | eBook: Reflowable eTextbook (ePub) |
Język | angielski |
ISBN | 9780081021408 |
Kategorie | Nauka o materiałach, Inżynieria elektroniczna i komunikacyjna |
CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends.
The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements.
CMOS Past, Present and Future