Features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in these domains.
Advances in Imaging and Electron Physics: Volume 164
Magnetolithography - from the Bottom-Up Route to High Throughput - Amos Bardea and Ron Naaman
The Optics of the Spatial Coherence Wavelets - Roman Castaneda
Common Diffraction Integral Calculation Based on Fast Fourier Transform Algorithm - LI Junchang, WU Yanmei and LI Yan
A generalized approach to describe the interference contrast and the phase contrast method - Marcel Teschke and Stefan Sinzinger
Nonlinear partial differential equations for noise problems - Booyong Choi
Harmuth Corrigenda - Henning Harmuth
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