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Introduction to Microelectronics to Nanoelectronics: Design and Technology

Introduction to Microelectronics to Nanoelectronics: Design and Technology

Authors
Publisher Taylor & Francis Ltd
Year 25/11/2020
Pages 328
Version hardback
Readership level College/higher education
Language English
ISBN 9780367502379
Categories Light (optics), Environmental science, engineering & technology
$141.48 (with VAT)
628.95 PLN / €134.85 / £117.06
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Book description

Focussing on micro- and nanoelectronics design and technology, this book provides thorough analysis and demonstration, starting from semiconductor devices to VLSI fabrication, designing (analog and digital), on-chip interconnect modeling culminating with emerging non-silicon/ nano devices. It gives detailed description of both theoretical as well as industry standard HSPICE, Verilog, Cadence simulation based real-time modeling approach with focus on fabrication of bulk and nano-devices. Each chapter of this proposed title starts with a brief introduction of the presented topic and ends with a summary indicating the futuristic aspect including practice questions. Aimed at researchers and senior undergraduate/graduate students in electrical and electronics engineering, microelectronics, nanoelectronics and nanotechnology, this book:








Provides broad and comprehensive coverage from Microelectronics to Nanoelectronics including design in analog and digital electronics.







Includes HDL, and VLSI design going into the nanoelectronics arena.







Discusses devices, circuit analysis, design methodology, and real-time simulation based on industry standard HSPICE tool.







Explores emerging devices such as FinFETs, Tunnel FETs (TFETs) and CNTFETs including their circuit co-designing.




Covers real time illustration using industry standard Verilog, Cadence and Synopsys simulations.

Introduction to Microelectronics to Nanoelectronics: Design and Technology

Table of contents

Chapter 1 SEMICONDUCTOR PHYSICS AND DEVICES

1.1 Introduction

1.1.1 Conduction in Solids

1.1.2 Conductors, Semiconductors, and Insulator

1.1.3 P-Type and N-Type Semiconductors

1.1.4 Semiconductor Conductivity

1.2 Diodes

1.2.1 Diode Structure and Characteristics

1.2.2 PN Diode Structure

1.2.3 Zener Diode Structure

1.2.4 Diode Applications

1.3 Bipolar Junction Transistors

1.3.1 Symbol and Physical Structure

1.3.2 BJT Configuration

1.3.3 Second Order Effects

1.4 Field Effect Transistors

1.4.1 Junction Field Effect Transistors (JFET)

1.4.2 Metal Oxide Semiconductor Field Effect Transistor (MOSFET)

1.4.3 Advantages of MOSFET over JFET

1.5 Emerging Devices beyond MOS

1.5.1 Issues with CMOS Technology Scaling

1.5.2 Emerging Nano-scale Device Technologies

1.6 Summary

1.7 Multiple Choice Questions

1.8 Short Answer Questions

1.9 Long Answer Questions

1.10 References





CHAPTER 2 VLSI SCALING AND FABRICATION

2.1 Introduction to VLSI Scaling

2.1.1 History and Introduction of VLSI Technology

2.1.2 VLSI Design's Concept

2.1.3 Moore's Law

2.1.4 Scale of Integration

2.1.5 Types of VLSI Chips ( Analog & Digital)

2.1.6 Layout, and Micron & Lambda Rules

2.2 VLSI Fabrication Process

2.2.1 Purification, Crystal Growth, and Wafer Processing (CZ and FZ Process)

2.2.2 Oxidation

2.2.3 Epitaxial Deposition

2.2.4 Lithography

2.2.5 Polysilicon and Dielectric Deposition

2.2.6 Diffusion

2.2.7 Ion Implementation

2.2.8 Metallization

2.2.9 Etching Process

2.3 Basic CMOS Technology

2.3.1 N-Well and P-Well CMOS Process

2.3.2 Twin Tub Process

2.4 Summary

2.5 Multiple Choice Questions

2.6 Short Answer Questions

2.7 Long Answer Questions

2.8 References





CHAPTER 3 MOSFET MODELING

3.1 Introduction to MOS Transistor

3.1.1 Characteristics of MOS Transistor

3.1.2 Hot Carrier Effects

3.1.3 Parasitics of MOSFET

3.1.4 MOSFET Circuit Models

3.2 MOS Capacitor

3.2.1 MOS Capacitor with Zero and Nonzero Bias

3.2.2 Capacitance-Voltage Curves

3.2.3 Anomalous Capacitance-Voltage Curves

3.3 MOSFET DC and Dynamic Models

3.3.1 Pao-Sah Model

3.3.2 Charge Sheet Model

3.3.3 Piece-Wise Model for Enhancement Devices

3.3.4 Small Geometry Model

3.3.5 Intrinsic Charge and Capacitance

3.3.6 Meyer Model

3.4 MOSFET Modeling using SPICE

3.4.1 Basic Concepts of Modeling

3.4.2 Model Equations

3.4.3 Examples using HSPICE

3.5 Summary

3.6 Multiple Choice Questions

3.7 Short Answer Questions

3.8 Long Answer Questions

3.9 References





CHAPTER 4 COMBINATIONAL AND SEQUENTIAL DESIGN IN CMOS

4.1 CMOS Inverter

4.1.1 Design

4.1.2 Operation

4.1.3 Transient and VTC Characteritsitics

4.1.4 Significance of CMOS Inverter

4.2 Static Behavior of Inverter

4.2.1 Switching Threshold

4.2.2 Noise Margin

4.2.3 Robustness of CMOS inverter by scaling supply voltage

4.3 Dynamic behavior of CMOS inverter

4.3.1 Capacitances

4.3.2 Power and Energy consumption

4.4 Design of Combinational Logic Design

4.4.1 Complementary CMOS logic

4.4.2 Ratioed Logic

4.4.3 Pass-Transistor Logi

4.5 CMOS Sequential Design

4.5.1 Introduction

4.5.2 Metrics for CMOS Sequential Design

4.6 Static Latches and Registers

4.6.1 The Bistability Principle

4.6.2 SR Flip-Flops

4.6.3 D-latches and Flip-Flops

4.6.4 Master slave Flip-flop

4.7 Summary

4.8 Multiple Choice Questions

4.9 Short Questions

4.10 Long Questions

4.11 References







CHAPTER 5 ANALOG CIRCUIT DESIGN

5.1 Introduction to Analog Design

5.2 MOS device from Analog perspective

5.2.1 I/V Characteristics

5.2.2 Second-order Effects

5.2.3 MOS Small Signal Model

5.3 Single Stage Amplifier

5.3.1 Common Source

5.3.2 Common Gate

5.3.3 Source Follower

5.4 Current mirrors

5.4.1 Introduction

5.4.2 Basic Current Mirror

5.4.3 Cascode current Mirror

5.5 Differential Amplifiers

5.5.1 Single ended and differential Operation

5.5.2 Basic Differential Pair

5.5.3 Differential Pair with MOS load

5.6 Operational Amplifiers

5.6.1 Fundamentals and General Op-amp metrics

5.6.2 Two Stage Op-amp

5.7 Digital-to-Analog and Analog-to-Digital Converters

5.7.1 Introduction

5.7.2 Types of Digital-to-Analog Converters

5.7.3 Types of Analog-to-Digital Converters

5.8 Summary

5.9 Multiple Choice Questions

5.10 Short Answer Questions

5.11 Long Answer Questions

5.12 References

CHAPTER 6: DIGITAL DESIGN THROUGH VERILOG HDL

6.1 Introduction

6.1.1 What is Verilog HDL

6.1.2 Backgrounnd

6.1.3 Compiler Directives

6.1.4 Data Types

6.1.5 Operators

6.2 Module and Test bench Definitions

6.2.1 Module

6.2.2 Test bench

6.3 Gate-Level Modeling

6.3.1 Built-in primitives

6.3.2 Single and multiple input gates

6.3.3 Tristate gates

6.3.4 MOS Switch

6.3.5 Gate Delays

6.3.6 Example

6.4 Dataflow Modeling

6.4.1 Continuous Assignments

6.4.2 Delays

6.4.3 Examples: Verilog Program for Full Adder

6.5 Behavioral Modeling

6.5.1 Initial Statement

6.5.2 Always Statement

6.5.3 Procedural Assignments

6.5.4 Conditional Statements

6.5.5 Loop Statements

6.5.6 Examples

6.6 Tasks and Functions

6.6.1 Tasks

6.6.2 Functions

6.7 Summary

6.8 Multiple Choice Questions

6.9 Short Questions

6.10 Long Questions

6.11 References





CHAPTER 7 VLSI INTERCONNECT AND IMPLEMENTATION

7.1 An overview of the VLSI Interconnect Problem

7.1.1 Interconnect Scaling Problem

7.1.2 Implementation of Interconnect Problem

7.2 Interconnect Aware Design Methodology and Electrical Modeling

7.2.1 Impact of Scaling

7.2.2 Transistor Scaling

7.2.3 Interconnect Scaling

7.3 Electrical Circuit Model of Interconnect

7.3.1 Ideal Interconnect

7.3.2 Resistive Interconnect

7.3.3 Capacitive Interconnect

7.3.4 Resistive Interconnect Tree

7.4 Estimation of Interconnect Parasitics

7.4.1 Interconnect Resistance Estimation

7.4.2 Interconnect Inductance Estimation

7.4.3 Interconnect Capacitance Estimation

7.4.3.1 Parallel Plate Capacitor

7.4.3.2 Fringing Capacitance

7.4.3.3 Lateral Capacitance

7.5 Calculation of Interconnect Delay

7.5.1 RC Delay Model

7.5.2 Elmore Delay Model

7.5.3 Transfer Function Model based on ABCD Parameter matrix

7.5.4 Finite Difference Time Domain Model (FDTD)

7.6 Estimation of Interconnect Crosstalk Noise

7.7 Estimation of Interconnect Power Dissipation

7.8 Summary

7.9 Multiple Choice Questions

7.10 Short Answer Questions

7.11 Long Answer Questions

7.12 References





CHAPTER 8 VLSI DESIGN AND TESTABILITY

8.1 Preamble

8.2 Basic Digital Troubleshoot

8.2.1 Manufacturing Test

8.2.2 Tester and Test Fixtures

8.2.3 Test Programs

8.3 Effect of Physical Faults on Circuit Behavior

8.3.1 Fault Models

8.3.1.1 Line Stuck-at Faults

8.3.1.2 Transistor Stuck-at Faults

8.3.1.3 Floating Line Faults

8.3.1.4 Bridging Faults

8.4 Test Principles of Manufacturing

8.4.1 Observability

8.4.2 Controllability

8.4.3 Fault Coverage

8.4.4 Automatic Test Pattern Generation (ATPG)

8.4.5 Delay Fault Testing

8.5 Test Approaches

8.5.1 Ad Hoc DFT Techniques

8.5.2 Scan Design Test

8.5.3 Built-in-Self-Test (BIST)

8.5.4 IDDQ Testing

8.6 Design for Manufacturability (DFM)

8.7 System on Chip (SOC) Testing

8.8 Summary

8.9 Multiple Choice Questions

8.10 Short Answer Questions

8.11 Long Questions

8.12 References





CHAPTER 9 NANO-MATERIALS AND APPLICATIONS

9.1 Preamble of Nano-Materials

9.2 Introduction to Carbon Nanotubes (CNTs)

9.2.1 The concept of Chirality on CNT

9.2.2 Electronic Band Structure

9.2.3 Brillouin zone

9.3 Overview of Graphene Nanoribbon (GNR)

9.4 Properties of CNT and GNR

9.5 Fabrication Approaches for Graphene Nanostructure

9.5.1 The transfer process of graphene on the Si/SiO2 substrate

9.5.2 CNT Fabrications

9.6 Application of Nano-materials

9.6.1 Graphene Nanoribbon Interconnect

9.6.2 Carbon Nanotube based Interconnect

9.6.3 Nano-Sensor

9.6.4 Nanomaterial Based Combat Jacket

9.6.5 Nano Bio-Sensor for Drug Delivery

9.7 Summary

9.8 Multiple Choice Questions

9.9 Short Answer Questions

9.10 Long Answer Questions

9.11 References





CHAPTER 10 NANOSCALE TRANSISTORS

10.1 Issues with CMOS technology scaling

10.1.1 Velocity Saturation and Mobility Degradation

10.1.2 Tunneling Limit

10.1.3 High Field Effects

10.1.4 Power Limitation

10.1.5 Material limitation

10.2 Tunnel FET

10.2.1 Device Structure and Models

10.2.2 Device Characteristics

10.2.3 TFET based Circuit design

10.3 Negative Capacitance FET

10.3.1 Device Structure

10.3.2 Principle of operation

10.3.3 Low subthreshold swing and high ON current

10.3.4 Hysteresis Characteristics

10.3.5 NCFET device based inverter and digital logic design

10.4 Carbon Nanotube FET

10.4.1 Carbon nanotube (CNT)

10.4.2 Carbon nanotube FET (CNTFET)

10.4.2 Device Characteristics

10.5 Graphene Nanoribbon FET

10.5.1 Graphene structure and properties

10.5.2 Graphene nanoribbon FET (GNRFET)

10.6 Spintronic Devices

10.6.1 Principle of Operation

10.6.2 Spin based Devices

10.7 Summary

10.8 Multiple Choice Questions

10.9 Short Answer Questions

10.10 Long Answer Questions

10.11 References





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